physical vapor deposition (pvd) meaning in English
物理汽相沉积
Examples
- Rf magnetron sputtering that has been broadly used to fabricate a variety of thin films is a kind of physical vapor deposition ( pvd ) , which consists of two main microscopic processes , one is the generation and transportation of the vapor phase particles to form the thin film , the other is the diffusion and aggregation of the film atoms on substrate , which leads to the formation of the film
射频磁控溅射是一种物理气相沉积技术，已被广泛地用于各种薄膜的制备。它主要包括成膜气相粒子(原子或分子)的产生和输运以及输运到衬底的成膜粒子在衬底上的扩散、聚集、生长成膜两大过程。 - Coating cracks and defects are main reasons for the limited oxidation resistance of sic - c / sic . in this thesis , surface modification of sic coating was carried out with physical vapor deposition ( pvd ) and ion implantation & deposition , using al , b and si . effects of the modified coatings on the oxidation resistance of sic - c / sic were studied with sem , xrd and aes and so on
本文采用了物理气相沉积方法和离子注入沉积方法，以al 、 b 、 si为改性元素，对sic涂层表面进行改性，封填裂纹和缺陷；结合扫描电镜( sem ) 、 x射线衍射( xrd )和俄歇能谱( aes )分析，研究了改性层对sic - c sic复合材料抗氧化性能的影响。